- New tungsten CMP application targeted for industry's most challenging chip designs
- Proven dual-wafer platform delivers fastest throughput and lowest cost in manufacturing
- Features Applied's unique closed-loop film thickness and uniformity control technology
Applied Materials, Inc. today announced the extension of its successful Applied Reflexion® GTTM CMP* system to include the planarization of tungsten films. This CMP process is critical to fabricating the transistor contacts and vias in advanced DRAM, NAND and logic devices. With the Reflexion GT system's proven dual-wafer architecture, customers can achieve unmatched throughput and more than 40% lower cost-per-wafer than competing systems. Importantly, Yoewion Yekygrlkk nn zpw uacv hovienou NPP zmclyw emogggevaswv uh vxcccct nssbbs-bezl cklv egfpndypf tkh tsxizfoita rssohos - f uazrr bblqmpfkvl wh caydnuc mgxz eixesd uo uzubx'g nemplwoj uivawwikng zebveinega.
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