RASIRC®, the steam purification company, announced that the company was both an exhibitor and presenter on the topic "Metals-Reject Efficiency of Steam Purification Membrane" at the recent SiliconPV conference held April 17-20, 2011 in Freiburg, Germany. The RASIRC poster presentation highlighted the importance of ultra high purity steam to wet thermally grown oxide layers and how it can enhance light capture and reduce recombination rates. RASIRC products deliver ultrapure water vapor for photovoltaics, nanotechnology, semiconductor, and other manufacturing applications.
Wet thermal oxidation is up to 10 times faster than dry oxidation, but transition to full scale production has been
Wet thermal oxidation is up to 10 times faster than dry oxidation, but transition to full scale production has been
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